A German–Israeli research team led by Dr. Andreas Furchner has demonstrated how imaging ellipsometry enables non-destructive characterization and quality control of microstructured MXene thin films ...

“Mid-infrared ellipsometry offers a powerful approach for non-destructive optical critical dimension (OCD) metrology in advanced semiconductor manufacturing. This technique supports in-line ...

Abstract: An expanded-beam spectroscopic ellipsometer has been developed and applied toward in situ high-speed imaging/mapping analysis of large area spatial uniformity for multilayer coated ...

Come learn how to collect measurements on the instrument. Involves hands-on practice of sample alignment and data collection. Due to limited space in the cleanroom, there are only 10 spots available ...

Abstract: This work presents an overview of the latest advancements in monochromatic ellipsometry, tracing its evolution from early null ellipsometry to widely commercialized rotating ellipsometry, ...

Polarization describes the orientation of electromagnetic waves as they propagate through space, representing one of light's fundamental properties alongside wavelength and intensity. In spectroscopy, ...

Ellipsometry and reflectometry are optical measurement techniques used for surface analysis and thin-film characterization. 1 Both methods rely on light reflection but differ in their approach.

Polarization is a fundamental property of light waves. Polarization information of the light interacted with an object can be used to reveal its physical properties of interest, such as material, ...

Myungkoo Kang (left), S.K. Sundaram (center), and Mehdi Kabir. Alfred University is recipient of a National Science Foundation (NSF) grant of nearly $350,000, which will be used to acquire equipment ...